What type of gas produced when the IC technology, dry oxidation as compared to wet oxidation?

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In dry oxidation no gas is produced. In Wet Oxidation Hydrogen gas is produced. Wet Oxidation:- It is a form of hydro thermal reaction. The oxidation is done by involving the dissolved components in H2O with oxygen as a oxidizer. The chemical reaction is: Si + 2 H2O -> SiO2 + 2H2 Dry Oxidation:- Dry...
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In dry oxidation no gas is produced. In Wet Oxidation Hydrogen gas is produced. Wet Oxidation:- It is a form of hydro thermal reaction. The oxidation is done by involving the dissolved components in H2O with oxygen as a oxidizer. The chemical reaction is: Si + 2 H2O -> SiO2 + 2H2 Dry Oxidation:- Dry oxidation has lower growth rate than wet oxidation, although the oxide film quality is better. The chemical reaction for Silicon and Oxygen is:- Si + O2 -> SiO2. read less
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